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Search for "drift correction" in Full Text gives 8 result(s) in Beilstein Journal of Nanotechnology.
unDrift: A versatile software for fast offline SPM image drift correction
Beilstein J. Nanotechnol. 2023, 14, 1225–1237, doi:10.3762/bjnano.14.101
- for drift during the measurement (online drift correction) or afterwards (offline drift correction). With the currently available software tools, however, offline drift correction of SPM data is often a tedious and time-consuming task. This is particularly disadvantageous when analyzing long image
- series. Here, we present unDrift, an easy-to-use scientific software for fast and reliable drift correction of SPM images. unDrift provides three different algorithms to determine the drift velocity based on two consecutive SPM images. All algorithms can drift-correct the input data without any
- additional reference. The first semi-automatic drift correction algorithm analyzes the different distortion of periodic structures in two consecutive up and down (down and up) images, which enables unDrift to correct SPM images without stationary features or overlapping scan areas. The other two algorithms
High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography
Beilstein J. Nanotechnol. 2018, 9, 2049–2056, doi:10.3762/bjnano.9.194
- in Figure 1b–d. Removal of large volumes of material (for instance, 100 µm diameter, 500 nm gold thickness [36]) usually means lengthy processes that require an multi-pass-exposure (MP-E) strategy as depicted in Figure 1b, and involves drift correction steps in between cycles [29][35][36]. In some
- cases, the drift correction can be unnecessary, but the MP-E can still be desired when a better dose distribution or a well-defined wall geometry is aimed for in structures with higher aspect ratio [38]. We have shown that a much faster process can be devised by employing a single-pass-exposure (SP-E
- written in the gold film using a focused Ga+ ion beam. Several fabrication strategies are shown in b), c) and d). In b) a multi-pass exposure (MP-E) scheme with drift correction steps in between each cycle is followed. MP-E is a good strategy for large patterns and thicker gold films [35][36]. In c) a
Exploring wear at the nanoscale with circular mode atomic force microscopy
Beilstein J. Nanotechnol. 2017, 8, 2662–2668, doi:10.3762/bjnano.8.266
- 35 nm) and B shows the AFM topographic images, before and after wear respectively, for a given location on a copper-based composite (the counter-body is a silicon nitride probe); C (grey scale is 16 nm) is the height difference of the topographic images (B) − (A). The drift correction has been
Lower nanometer-scale size limit for the deformation of a metallic glass by shear transformations revealed by quantitative AFM indentation
Beilstein J. Nanotechnol. 2015, 6, 1721–1732, doi:10.3762/bjnano.6.176
- from 19.5 to 170 pm/s. After drift correction the indentation curves coincide as expected in the low load regime that corresponds to the elastic deformation. A drawback of AFM indentation experiments is that no controlled manufacturing of the tip apex is available at the nanometer scale and one has to
- ) before and (b) after drift correction; the drift velocity difference with respect to the fastest measurements were Δv = −19.5, 46, and 170 pm/s for dP/dt = 36, 72, and 144 nN/s, respectively. (a) SEM image of the diamond coated AFM tip used for all measurements presented in this report; tip geometry
Possibilities and limitations of advanced transmission electron microscopy for carbon-based nanomaterials
Beilstein J. Nanotechnol. 2015, 6, 1541–1557, doi:10.3762/bjnano.6.158
- metal-oxide semiconductor) sensor up to 1600 fps [50]. The high sensitivity and fast acquisition in detecting has made possible the automated and ultra-fast acquisition of a series of under-exposed images from the same region. After drift correction, the images of such a sequence are stacked and can
High sensitivity and high resolution element 3D analysis by a combined SIMS–SPM instrument
Beilstein J. Nanotechnol. 2015, 6, 1091–1099, doi:10.3762/bjnano.6.110
- topographies are taken as reference maps for linearly extrapolating the z-position of each of the intermittent SIMS recorded voxels. SARINA was developed as a plugin for the ImageJ software [13]. The drift correction of the different recorded SIMS stacks were performed using the OpenMIMS software [14], which
Dimer/tetramer motifs determine amphiphilic hydrazine fibril structures on graphite
Beilstein J. Nanotechnol. 2012, 3, 658–666, doi:10.3762/bjnano.3.75
- creep to a minimum during measurements. Furthermore, images used for structural analysis were those with minimal thermal drift, and a drift correction was done whenever feasible. For imaging of molecular structures, the tip was retracted slightly, and a drop of the solution was applied onto the basal
Probing three-dimensional surface force fields with atomic resolution: Measurement strategies, limitations, and artifact reduction
Beilstein J. Nanotechnol. 2012, 3, 637–650, doi:10.3762/bjnano.3.73
- unit cell in the time required to collect an image, are also potentially problematic and in some cases limit layer-by-layer data acquisition to low temperatures [23]. An alternative approach to x–y drift correction involves manual post-data-acquisition shifting of images acquired by the layer-by-layer
- inability to correct for elastic deformations of the tip apex jeopardizes the reliability of such real-time approaches to drift correction to the extent that it is unclear a priori which approach to drift correction, i.e., real-time or post-acquisition, is superior. The effects of tip asymmetry on simulated
- drift correction at set time intervals (“method C”) [28][31]. Table 1 summarizes to what extent the methods listed above address the specific experimental issues discussed earlier. Note, however, that other combinations of experimental and data analysis procedures are possible, and experimentalists can
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